US Patent Issued to NISSAN CHEMICAL on June 23 for "Resist underlayer film-forming composition" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,718, issued on June 23, was assigned to NISSAN CHEMICAL Corp. (Tokyo). "Resist underlayer film-forming composition" was invented by Hirokaz... Read More

US Patent Issued to NISSAN CHEMICAL on June 23 for "Resist underlayer film-forming composition" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,719, issued on June 23, was assigned to NISSAN CHEMICAL Corp. (Tokyo). "Resist underlayer film-forming composition" was invented by Hiroto ... Read More

US Patent Issued to Semes, Seoul National University R&DB Foundation on June 23 for "Apparatus for supplying liquid and apparatus for treating substrate" (South Korean Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,720, issued on June 23, was assigned to Semes Co. Ltd. (Chungcheongnam-do, South Korea) and Seoul National University R&DB Foundation (Seoul... Read More

US Patent Issued to Semes on June 23 for "Apparatus and method for treating substrate" (South Korean Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,721, issued on June 23, was assigned to Semes Co. Ltd. (Chungcheongnam-do, South Korea). "Apparatus and method for treating substrate" was ... Read More

US Patent Issued to Georgia Tech Research on June 23 for "System and method to control defects in projection-based sub-micrometer additive manufacturing" (Georgia Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,722, issued on June 23, was assigned to Georgia Tech Research Corp. (Atlanta). "System and method to control defects in projection-based su... Read More

US Patent Issued to FUJIFILM on June 23 for "Washout processor and washing method" (Japanese Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,723, issued on June 23, was assigned to FUJIFILM Corp. (Tokyo). "Washout processor and washing method" was invented by Masato Shirakawa (Ha... Read More

US Patent Issued to Taiwan Semiconductor Manufacturing on June 23 for "Lithography system with non-invasive monitoring and methods" (Taiwanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,724, issued on June 23, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Lithography system with non-invasiv... Read More

US Patent Issued to ASML Netherlands on June 23 for "Methods and systems to calibrate reticle thermal effects" (Dutch Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,725, issued on June 23, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands). "Methods and systems to calibrate reticle thermal e... Read More

US Patent Issued to ASML NETHERLANDS, CYMER on June 23 for "Optimization of lithographic process based on bandwidth and speckle" (Dutch, American Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,726, issued on June 23, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands) and CYMER LLC (San Diego). "Optimization of lithogra... Read More

US Patent Issued to ASML Netherlands on June 23 for "Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses" (Dutch, Belgian Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,727, issued on June 23, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands). "Method for correcting measurements in the manufact... Read More

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