ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,721, issued on June 23, was assigned to Semes Co. Ltd. (Chungcheongnam-do, South Korea).
"Apparatus and method for treating substrate" was invented by Moon Hyung Bae (Daegu, South Korea), Hye Bin Baek (Incheon, South Korea), Youngseo An (Osan-si, South Korea), Euntark Lee (Cheonan-si, South Korea), Min Jung Park (Daegu, South Korea), Seunghan Lee (Cheonan-si, South Korea) and Jung-Hyun Lee (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The inventive concept provides an apparatus and method for treating a substrate with a gas. The apparatus includes a chamber having a process space in which the substrate is treated, a substra...