ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,718, issued on June 23, was assigned to NISSAN CHEMICAL Corp. (Tokyo).
"Resist underlayer film-forming composition" was invented by Hirokazu Nishimaki (Toyama, Japan), Makoto Nakajima (Toyama, Japan) and Keisuke Hashimoto (Toyama, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The composition of the present invention contains a polymer to which there is attached a group represented by the following formula (1):(wherein each of Rx, Sy, and Sz represents a hydrogen atom or a monovalent organic group; each of Ry and Rz represents a single bond or a divalent organic group; each of ring Ary and ring Arz represents a C4 to C20 cyclic alkyl group or ...