US Patent Issued to ASML Netherlands on June 23 for "Methods and systems to calibrate reticle thermal effects" (Dutch Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,725, issued on June 23, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Methods and systems to calibrate reticle thermal effects" was invented by Raaja Ganapathy Subramanian (Maarheeze, Netherlands), Bearrach Moest (Eindhoven, Netherlands), Alexander Alexandrovich Danilin (Eindhoven, Netherlands), Rowin Meijerink (Valkenswaard, Netherlands), Tim Izaak Johannes Goossen (Waalre, Netherlands) and Stanislav Markovich Shumiacher (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of reducing effects of heating and/or cooling a reticle in a lithographic process includes conditioning the reticle to adjust an ini...