US Patent Issued to ASML NETHERLANDS, CYMER on June 23 for "Optimization of lithographic process based on bandwidth and speckle" (Dutch, American Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,726, issued on June 23, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands) and CYMER LLC (San Diego).

"Optimization of lithographic process based on bandwidth and speckle" was invented by Willard Earl Conley (San Diego), Duan-Fu Stephen Hsu (Fremont, Calif.), Joshua Jon Thornes (San Diego) and Johannes Jacobus Matheus Baselmans (Oirschot, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for improving a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic apparatus. The method includes computing a multi-variable cost function that is a function of: (i) a plurality of design ...