US Patent Issued to ASML Netherlands on June 23 for "Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses" (Dutch, Belgian Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,727, issued on June 23, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses" was invented by Han-Kwang Nienhuys (Veldhoven, Netherlands), Teis Johan Coenen (Vught, Netherlands), Sander Bas Roobol (Veldhoven, Netherlands), Jeroen Cottaar (Eindhoven, Netherlands), Seyed Iman Mossavat (Waalre, Netherlands), Niels Geypen (Lommel, Belgium), Sandy Claudia Scholz (Veldhoven, Netherlands) and Christina Lynn Porter (Veldhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a method of metrology. The method comprises il...