US Patent Issued to Taiwan Semiconductor Manufacturing on June 23 for "Lithography system with non-invasive monitoring and methods" (Taiwanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,724, issued on June 23, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Lithography system with non-invasive monitoring and methods" was invented by Chi Yang (Hsinchu, Taiwan), Po-Yuan Yeh (Hsinchu, Taiwan), Che-Hsin Lin (Hsinchu, Taiwan), Jen Chieh Yu (Hsinchu, Taiwan) and Chung Wen Luo (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes: forming a mask layer on a semiconductor wafer; forming a tin droplet, including: supplying tin to a high-pressure reservoir from a low-pressure reservoir; monitoring a level of tin in the high-pressure reservoir by at least two electrodes attached to th...