US Patent Issued to Georgia Tech Research on June 23 for "System and method to control defects in projection-based sub-micrometer additive manufacturing" (Georgia Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,722, issued on June 23, was assigned to Georgia Tech Research Corp. (Atlanta).

"System and method to control defects in projection-based sub-micrometer additive manufacturing" was invented by Sourabh Kumar Saha (Atlanta).

According to the abstract* released by the U.S. Patent & Trademark Office: "An exemplary optical projection method and system is disclosed, e.g., femtosecond projection two-photon lithography (FP-TPL) based operation, that applies multiple temporally focused light with reduced density of the projected mask to control over-polymerization defects (e.g., without need to tune the photopolymer composition) when certain aspect ratio of the submicron features are desir...