Publication

Byline

Location

US Patent Issued to THE AEROSPACE on Nov. 3 for "Patterned dark mirror coatings for multi-functional optics" (California Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,817, issued on Nov. 3, was assigned to THE AEROSPACE Corp. (El Segundo, Calif.). "Patterned dark mirror coatings for multi-functional optics... और पढ़ें


US Patent Issued to ASML NETHERLANDS on Nov. 3 for "Interface definition for lithographic apparatus" (Dutch Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,818, issued on Nov. 3, was assigned to ASML NETHERLANDS (Veldhoven, Netherlands). "Interface definition for lithographic apparatus" was inve... और पढ़ें


US Patent Issued to LG CHEM on Nov. 3 for "Stripper composition for removing photoresist and stripping method of photoresist using the same" (South Korean Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,820, issued on Nov. 3, was assigned to LG CHEM Ltd. (Seoul, South Korea). "Stripper composition for removing photoresist and stripping metho... और पढ़ें


US Patent Issued to ASML NETHERLANDS on Nov. 3 for "Method for determining mask pattern and training machine learning model" (California Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,822, issued on Nov. 3, was assigned to ASML NETHERLANDS (Veldhoven, Netherlands). "Method for determining mask pattern and training machine ... और पढ़ें


US Patent Issued to Carl Zeiss SMT on Nov. 3 for "Method for simulating illumination and imaging properties of an optical production system when illuminating and imaging an object by means of an optical measurement system" (German Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,824, issued on Nov. 3, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany). "Method for simulating illumination and imaging properties... और पढ़ें


US Patent Issued to ASML NETHERLANDS on Nov. 3 for "Diffraction-based pupil determination for optimization of lithographic processes" (California Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,825, issued on Nov. 3, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands). "Diffraction-based pupil determination for optimizati... और पढ़ें


US Patent Issued to Carl Zeiss SMT on Nov. 3 for "Measurement apparatus, method for operating a mask-metrology measurement apparatus, and computer program product" (German Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,826, issued on Nov. 3, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany). "Measurement apparatus, method for operating a mask-metrol... और पढ़ें


US Patent Issued to ASML NETHERLANDS on Nov. 3 for "Lithographic method" (Dutch Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,827, issued on Nov. 3, was assigned to ASML NETHERLANDS (Veldhoven, Netherlands). "Lithographic method" was invented by Pioter Nikolski (Vel... और पढ़ें


US Patent Issued to KLA on Nov. 3 for "System and method for target centering detection in overlay metrology" (Israeli Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,828, issued on Nov. 3, was assigned to KLA Corp. (Milpitas, Calif.). "System and method for target centering detection in overlay metrology"... और पढ़ें


US Patent Issued to ASML NETHERLANDS on Nov. 3 for "Overlay metrology based on template matching with adaptive weighting" (California Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,829, issued on Nov. 3, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands). "Overlay metrology based on template matching with ad... और पढ़ें