US Patent Issued to Carl Zeiss SMT on Nov. 3 for "Measurement apparatus, method for operating a mask-metrology measurement apparatus, and computer program product" (German Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,826, issued on Nov. 3, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).

"Measurement apparatus, method for operating a mask-metrology measurement apparatus, and computer program product" was invented by Jan Reisloehner (Jena, Germany), Thomas Frank (Jena, Germany) and Ulrich Matejka (Jena, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "Method for operating a mask-metrology measurement apparatus, wherein an image of a section of a photomask is recorded with a first image sensor and wherein an aerial image is generated by virtue of the image raw data obtained with the image sensor being subjected to a clear normalization. The aerial i...