US Patent Issued to ASML NETHERLANDS on Nov. 3 for "Method for determining mask pattern and training machine learning model" (California Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,822, issued on Nov. 3, was assigned to ASML NETHERLANDS (Veldhoven, Netherlands).

"Method for determining mask pattern and training machine learning model" was invented by Jun Tao (Cupertino, Calif.), Yu Cao (Saratoga, Calif.) and Christopher Alan Spence (Los Altos, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for determining a mask pattern and a method for training a machine learning model. The method for generating data for a mask pattern associated with a patterning process includes obtaining (i) a first mask image (e.g., CTM) associated with a design pattern, (ii) a contour (e.g., a resist contour) based on the first mask image,...