US Patent Issued to ASML NETHERLANDS on Nov. 3 for "Overlay metrology based on template matching with adaptive weighting" (California Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,829, issued on Nov. 3, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Overlay metrology based on template matching with adaptive weighting" was invented by Jiyou Fu (San Jose, Calif.), Jing Su (Fremont, Calif.), Chenxi Lin (Fremont, Calif.), Jiao Liang (San Jose, Calif.), Guangqing Chen (Fremont, Calif.) and Yi Zou (Foster City, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of image template matching for multiple process layers of, for example, semiconductor substrate with an adaptive weight map is described. An image template is provided with a weight map, which is adaptively updated based during template matching ...