US Patent Issued to KLA on Nov. 3 for "System and method for target centering detection in overlay metrology" (Israeli Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,828, issued on Nov. 3, was assigned to KLA Corp. (Milpitas, Calif.).

"System and method for target centering detection in overlay metrology" was invented by Ofer Manos (Migdal HaEmek, Israel), Sveta Grechin (Migdal HaEmek, Israel), Ran Trifon (Migdal HaEmek, Israel), Yang Yu (Migdal HaEmek, Israel), Mohamed Hegaze (Migdal HaEmek, Israel), Avner Safrani (Misgav, Israel) and Ohad Bachar (Timrat, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system for target centering detection may be configured receive one or more acquisition images of a sample from an overlay metrology sub-system and determine, using a machine learning-based centering model...