US Patent Issued to LG CHEM on Nov. 3 for "Stripper composition for removing photoresist and stripping method of photoresist using the same" (South Korean Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,820, issued on Nov. 3, was assigned to LG CHEM Ltd. (Seoul, South Korea).

"Stripper composition for removing photoresist and stripping method of photoresist using the same" was invented by Tae Moon Park (Daejeon, South Korea), Dong Hoon Lee (Daejeon, South Korea), Hyun Woo Song (Daejeon, South Korea) and Woo Ram Lee (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "This invention relates to a stripper composition for removing photoresist that may have excellent photoresist stripping force, inhibit corrosion of the under metal film in the stripping process, and effectively remove oxide, and a method for stripping photoresist using t...