US Patent Issued to ASML NETHERLANDS on Nov. 3 for "Interface definition for lithographic apparatus" (Dutch Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,818, issued on Nov. 3, was assigned to ASML NETHERLANDS (Veldhoven, Netherlands).

"Interface definition for lithographic apparatus" was invented by Jacob Fredrik Friso Klinkhamer (Tilburg, Netherlands) and Michel Alphons Theodorus Van Hinsberg (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for representing control parameter data for controlling a lithographic apparatus during a scanning exposure of an exposure field on a substrate, the method including: obtaining a set of periodic base functions, each base function out of the set of periodic base functions having a different frequency and a period smaller than a dimen...