US Patent Issued to ASML NETHERLANDS on Nov. 3 for "Lithographic method" (Dutch Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,827, issued on Nov. 3, was assigned to ASML NETHERLANDS (Veldhoven, Netherlands).

"Lithographic method" was invented by Pioter Nikolski (Veldhoven, Netherlands) and Rick Jeroen Meijerink (Den Bosch, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of forming a pattern on a substrate using a lithographic apparatus provided with a patterning device and a projection system having chromatic aberrations, the method including: providing a radiation beam having a plurality of wavelength components to the patterning device; forming an image of the patterning device on the substrate using the projection system to form the pattern, wherein a...