US Patent Issued to S&S TECH on June 23 for "Phase shift blankmask and photomask for EUV lithography" (South Korean Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,707, issued on June 23, was assigned to S&S TECH Co. Ltd. (Daegu-si, South Korea). "Phase shift blankmask and photomask for EUV lithography... Read More

US Patent Issued to Intel on June 23 for "System and method for reducing pellicle rupture" (Oregon, California Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,708, issued on June 23, was assigned to Intel Corp. (Santa Clara, Calif.). "System and method for reducing pellicle rupture" was invented b... Read More

US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on June 23 for "Pellicle and method of manufacturing thereof" (Taiwanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,709, issued on June 23, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Pellicle and method of manufact... Read More

US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on June 23 for "Pellicle having vent hole" (Taiwanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,710, issued on June 23, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Pellicle having vent hole" was ... Read More

US Patent Issued to Taiwan Semiconductor Manufacturing on June 23 for "Method and system to for rapid inspection of photolithography reticle" (Taiwanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,711, issued on June 23, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Method and system to for rapid insp... Read More

US Patent Issued to CANON on June 23 for "Forming method, forming apparatus, and article manufacturing method" (Japanese Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,712, issued on June 23, was assigned to CANON K.K. (Tokyo). "Forming method, forming apparatus, and article manufacturing method" was inven... Read More

US Patent Issued to Koninklijke Philips on June 23 for "Imprinting apparatus" (Dutch, German Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,713, issued on June 23, was assigned to Koninklijke Philips N.V. (Eindhoven, Netherlands). "Imprinting apparatus" was invented by Didier Ma... Read More

US Patent Issued to SHIN-ETSU CHEMICAL on June 23 for "Resist composition and pattern forming process" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,714, issued on June 23, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo). "Resist composition and pattern forming process" was invented ... Read More

US Patent Issued to Chang Chun Plastics on June 23 for "Photosensitive resin film and application thereof" (Taiwanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,715, issued on June 23, was assigned to Chang Chun Plastics Co. Ltd. (Taipei City, Taiwan). "Photosensitive resin film and application ther... Read More

US Patent Issued to NISSAN CHEMICAL on June 23 for "Chemical-resistant protective film" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,716, issued on June 23, was assigned to NISSAN CHEMICAL Corp. (Tokyo). "Chemical-resistant protective film" was invented by Tokio Nishita (... Read More

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