ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,716, issued on June 23, was assigned to NISSAN CHEMICAL Corp. (Tokyo).
"Chemical-resistant protective film" was invented by Tokio Nishita (Toyama, Japan) and Yuki Endo (Toyama, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A protective film formation composition contains a polymer having a unit structure represented by formula (1-1), a compound or a polymer having phenolic hydroxy group other than catechol, (C) a thermal acid generator, and (D) a solvent. (Ar represents a benzene, naphthalene, or an anthracene ring; R1 represents a hydroxy, mercapto, amino, halogeno, or an alkyl group that has 1-10 carbon atoms and that may be substituted or ...