ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,715, issued on June 23, was assigned to Chang Chun Plastics Co. Ltd. (Taipei City, Taiwan).
"Photosensitive resin film and application thereof" was invented by Zih-I Chuang (Taipei City, Taiwan), Yun-Jung Wu (Taipei City, Taiwan) and An-Pang Tu (Taipei City, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A photosensitive resin film and application thereof are provided. When the photosensitive resin film is subjected to a thermogravimetric analysis under the conditions of heating at a rate of 5deg C./min from 40deg C. to 200deg C. and then keeping the temperature at 200deg C. for 10 min, the absolute value of the first derivative of the weight...