US Patent Issued to SHIN-ETSU CHEMICAL on June 23 for "Resist composition and pattern forming process" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,714, issued on June 23, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Resist composition and pattern forming process" was invented by Yutaro Otomo (Joetsu, Japan) and Tomohiro Kobayashi (Joetsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A resist composition comprising an acid compound, a photoacid generator of iodonium salt type and/or a photo-decomposable quencher of iodonium salt type, and a base polymer has a high sensitivity, reduced edge roughness or size variation, improved resolution and satisfactory storage stability."

The patent was filed on July 26, 2023, under Application No. 18/226,436.

*For further information, incl...