US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on June 23 for "Pellicle and method of manufacturing thereof" (Taiwanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,709, issued on June 23, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Pellicle and method of manufacturing thereof" was invented by Pei-Cheng Hsu (Hsinchu, Taiwan), Hsin-Chang Lee (Hsinchu, Taiwan), Huan-Ling Lee (Hsinchu, Taiwan) and Chin-Hsiang Lin (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A pellicle for an EUV photo mask includes a membrane attached to a frame. The membrane includes nanotubes, Ru-O-X catalyst structures partially covering a surface of each nanotube, and a protection layer to cover the Ru-O-X catalyst structures and the surface of each nanotube. X is a metal element of Mo...