US Patent Issued to Taiwan Semiconductor Manufacturing on June 23 for "Method and system to for rapid inspection of photolithography reticle" (Taiwanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,711, issued on June 23, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Method and system to for rapid inspection of photolithography reticle" was invented by Jia-Lin Syu (Hsinchu, Taiwan), Tai-Yu Chen (Hsinchu, Taiwan), Yi-Zhen Chen (Hsinchu, Taiwan), Yen-Hsun Chen (Hsinchu, Taiwan), Shang-Chieh Chien (Hsinchu, Taiwan) and Li-Jui Chen (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for operating a reticle inspection system includes training an analysis model of the reticle inspection system with a machine learning process, generating a difference threshold based on the machine learning proces...