ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,710, issued on June 23, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Pellicle having vent hole" was invented by Chue San Yoo (Hsinchu, Taiwan), Chih-Chiang Tu (Hsinchu, Taiwan), Chien-Cheng Chen (Hsinchu, Taiwan), Jong-Yuh Chang (Hsinchu, Taiwan), Kun-Lung Hsieh (Hsinchu, Taiwan), Pei-Cheng Hsu (Hsinchu, Taiwan), Hsin-Chang Lee (Hsinchu, Taiwan) and Yun-Yue Lin (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A pellicle includes a frame having an attachment surface configured to attach to a photomask, wherein the frame comprises a vent hole. The pellicle further includes a filter covering the ven...