US Patent Issued to BRUKER NANO on April 14 for "Detector and method for obtaining Kikuchi images" (German Inventor)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,603,246, issued on April 14, was assigned to BRUKER NANO GMBH (Berlin). "Detector and method for obtaining Kikuchi images" was invented by Uwe... Read More

US Patent Issued to Advanced Energy Industries on April 14 for "Transition control in a bias supply" (Colorado Inventor)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,603,247, issued on April 14, was assigned to Advanced Energy Industries Inc. (Denver). "Transition control in a bias supply" was invented by H... Read More

US Patent Issued to Tokyo Electron on April 14 for "Plasma processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,603,248, issued on April 14, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma processing apparatus" was invented by Torai Iwasa (Kurokawag... Read More

US Patent Issued to Tokyo Electron on April 14 for "Selective deposition using differential surface charging" (Texas Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,603,249, issued on April 14, was assigned to Tokyo Electron Ltd. (Tokyo). "Selective deposition using differential surface charging" was inven... Read More

US Patent Issued to TES on April 14 for "Hybrid chamber" (South Korean Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,603,251, issued on April 14, was assigned to TES Co. LTD (Yongin-si, South Korea). "Hybrid chamber" was invented by Jae-Woo Kim (Seongnam-si, ... Read More

US Patent Issued to Applied Materials on April 14 for "Low-flow radical gas geometrical control through two-dimensional compression between plasma source and chemical reactor" (California Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,603,252, issued on April 14, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Low-flow radical gas geometrical control through t... Read More

US Patent Issued to Kokusai Electric on April 14 for "Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium" (Japanese Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,603,253, issued on April 14, was assigned to Kokusai Electric Corp. (Tokyo). "Substrate processing apparatus, method of manufacturing semicond... Read More

US Patent Issued to Tokyo Electron on April 14 for "Etching method and plasma processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,603,254, issued on April 14, was assigned to Tokyo Electron Ltd. (Tokyo). "Etching method and plasma processing apparatus" was invented by Aki... Read More

US Patent Issued to Hitachi High-Tech on April 14 for "Plasma processing apparatus and plasma processing method" (Japanese Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,603,255, issued on April 14, was assigned to Hitachi High-Tech Corp. (Tokyo). "Plasma processing apparatus and plasma processing method" was i... Read More

US Patent Issued to Beijing E-Town Semiconductor Technology, Mattson Technology on April 14 for "Conductive member for cleaning focus ring of a plasma processing apparatus" (American, Chinese Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,603,256, issued on April 14, was assigned to Beijing E-Town Semiconductor Technology Co. Ltd. (Beijing) and Mattson Technology Inc. (Fremont, C... Read More

• ««
• «
• 9620
• 9621
• 9622
• 9623
• 9624
• 9625
• 9626
• 9627
• 9628
• 9629
• »
• »»