ALEXANDRIA, Va., April 15 -- United States Patent no. 12,603,256, issued on April 14, was assigned to Beijing E-Town Semiconductor Technology Co. Ltd. (Beijing) and Mattson Technology Inc. (Fremont, Calif.).

"Conductive member for cleaning focus ring of a plasma processing apparatus" was invented by Maolin Long (Santa Clara, Calif.) and Changle Guan (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "A pedestal assembly is provided. The pedestal assembly includes an electrostatic chuck configured to support a workpiece. The pedestal assembly includes a focus ring have a top surface and a bottom surface. The focus ring can be configured to surround a periphery of the workpiece when the workpiece is positi...