US Patent Issued to Tokyo Electron on April 14 for "Selective deposition using differential surface charging" (Texas Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,603,249, issued on April 14, was assigned to Tokyo Electron Ltd. (Tokyo).

"Selective deposition using differential surface charging" was invented by Ya-Ming Chen (Austin, Texas), Shyam Sridhar (Austin, Texas) and Peter Lowell George Ventzek (Austin, Texas).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes extracting electrons from a remote electron source to negatively charge upper surfaces of a patterned layer with the electrons, and extracting positive ions from a remote ion source to selectively deposit a material on the upper surfaces by attracting the positive ions to the electrons of the upper surfaces. The upper surfaces may be neg...