US Patent Issued to DONGJIN SEMICHEM on May 5 for "Positive photosensitive resin composition" (South Korean Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,144, issued on May 5, was assigned to DONGJIN SEMICHEM Co. LTD. (Incheon, South Korea). "Positive photosensitive resin composition" was inven... Read More

US Patent Issued to Sumitomo Chemical on May 5 for "Carboxylate, carboxylic acid generator, resin, resist composition and method for producing resist pattern" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,145, issued on May 5, was assigned to Sumitomo Chemical Co. Ltd. (Tokyo). "Carboxylate, carboxylic acid generator, resin, resist composition ... Read More

US Patent Issued to FUJIFILM on May 5 for "Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,147, issued on May 5, was assigned to FUJIFILM Corp. (Tokyo). "Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-se... Read More

US Patent Issued to Taiwan Semiconductor Manufacturing on May 5 for "Crosslinkable photoresist for extreme ultraviolet lithography" (Taiwanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,148, issued on May 5, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Crosslinkable photoresist for extreme u... Read More

US Patent Issued to Merck Patent on May 5 for "DNQ-free chemically amplified resist composition" (New Jersey Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,149, issued on May 5, was assigned to Merck Patent GmbH (Darmstadt, Germany). "DNQ-free chemically amplified resist composition" was invented... Read More

US Patent Issued to SHIN-ETSU CHEMICAL on May 5 for "Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,150, issued on May 5, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo). "Material for forming organic film, substrate for manufacturing se... Read More

US Patent Issued to TEXAS INSTRUMENTS on May 5 for "Monitor structure for photoresist thickness in trench" (Chinese, American Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,151, issued on May 5, was assigned to TEXAS INSTRUMENTS Inc. (Dallas). "Monitor structure for photoresist thickness in trench" was invented b... Read More

US Patent Issued to FUJIFILM on May 5 for "Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, method for producing electronic device, and method for producing onium salt" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,152, issued on May 5, was assigned to FUJIFILM Corp. (Tokyo). "Method for producing actinic ray-sensitive or radiation-sensitive resin compos... Read More

US Patent Issued to MacDermid Graphics Solutions on May 5 for "Thermal processor and method for using the same" (Georgia Inventor)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,153, issued on May 5, was assigned to MacDermid Graphics Solutions LLC (Waterbury, Conn.). "Thermal processor and method for using the same" ... Read More

US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on May 5 for "Lithography techniques for reducing defects" (Taiwanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,154, issued on May 5, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Lithography techniques for reducing... Read More

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