US Patent Issued to FUJIFILM on May 5 for "Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,147, issued on May 5, was assigned to FUJIFILM Corp. (Tokyo).

"Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device" was invented by Taro Miyoshi (Shizuoka, Japan), Yasunori Yonekuta (Shizuoka, Japan), Eiji Fukuzaki (Shizuoka, Japan) and Toshiya Takahashi (Shizuoka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An actinic ray-sensitive or radiation-sensitive resin composition containing (A) an acid-decomposable resin, (B) a compound represented by General Formula (b1), and (C) a compound represented by General For...