US Patent Issued to Merck Patent on May 5 for "DNQ-free chemically amplified resist composition" (New Jersey Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,149, issued on May 5, was assigned to Merck Patent GmbH (Darmstadt, Germany).

"DNQ-free chemically amplified resist composition" was invented by Weihong Liu (Branchburg, N.J.) and Chunwei Chen (Whitehouse Station, N.J.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The disclosed subject matter relates to resist compositions that include: (A) an acetal functionalized acrylic polymer component comprising repeat units selected from ones having structure (1), (2), (3), (4), (5), (6), and (7); (B) a tert-alkyl functionalized acrylic polymer component comprising repeat units selected from ones having structure (1a), (2a), (3a), (4a), (5a), (6a), and (7a); (...