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US Patent Issued to Huawei Technologies'Co., 'Ltd.' on Aug. 25 for "Memory, gate-all-around field-effect transistor, and manufacturing method" (Chinese Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,720,806, issued on Aug. 25, was assigned to Huawei Technologies'Co.'Ltd.' (Shenzhen, China). "Memory, gate-all-around field-effect transistor, ... Read More


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Aug. 25 for "Gate dielectric layers for stacked multi-gate device" (Taiwanese Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,720,807, issued on Aug. 25, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Gate dielectric layers for stac... Read More


US Patent Issued to Zinite on Aug. 25 for "Source/drain channel interface with nitrogen-containing oxide" (Canadian Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,720,808, issued on Aug. 25, was assigned to Zinite Corp. (Edmonton, Canada). "Source/drain channel interface with nitrogen-containing oxide" wa... Read More


US Patent Issued to Semiconductor Energy Laboratory on Aug. 25 for "Metal oxide, formation method of metal oxide, semiconductor device, and manufacturing method of semiconductor device" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,720,809, issued on Aug. 25, was assigned to Semiconductor Energy Laboratory Co. Ltd. (Kanagawa-ken, Japan). "Metal oxide, formation method of m... Read More


US Patent Issued to Hon Young Semiconductor on Aug. 25 for "Semiconductor device and forming method thereof" (Taiwanese Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,720,810, issued on Aug. 25, was assigned to Hon Young Semiconductor Corp. (Hsinchu City, Taiwan). "Semiconductor device and forming method ther... Read More


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Aug. 25 for "Lightly-doped channel extensions" (Taiwanese Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,720,811, issued on Aug. 25, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Lightly-doped channel extension... Read More


US Patent Issued to Nexperia on Aug. 25 for "Semiconductor power device with improved ruggedness" (Dutch, German Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,720,813, issued on Aug. 25, was assigned to Nexperia B.V. (Nijmegen, Netherlands). "Semiconductor power device with improved ruggedness" was in... Read More


US Patent Issued to Magnachip Semiconductor on Aug. 25 for "Fast recovery diode and method for manufacturing the same" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,720,814, issued on Aug. 25, was assigned to Magnachip Semiconductor Ltd. (Cheongju-si, South Korea). "Fast recovery diode and method for manufa... Read More


US Patent Issued to Silanna Asia on Aug. 25 for "Power device integration on a common substrate" (Florida, California Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,720,815, issued on Aug. 25, was assigned to Silanna Asia Pte Ltd (Singapore). "Power device integration on a common substrate" was invented by ... Read More


US Patent Issued to Mitsubishi Electric on Aug. 25 for "Semiconductor device" (Japanese Inventor)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,720,816, issued on Aug. 25, was assigned to Mitsubishi Electric Corp. (Tokyo). "Semiconductor device" was invented by Tatsuo Harada (Tokyo). A... Read More