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US Patent Issued to Renesas Electronics on Sept. 8 for "Method of manufacturing semiconductor device" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,417, issued on Sept. 8, was assigned to Renesas Electronics Corp. (Tokyo). "Method of manufacturing semiconductor device" was invented by Y... Read More


US Patent Issued to Tokyo Electron on Sept. 8 for "Substrate processing method and substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,418, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing method and substrate processing apparatus" was i... Read More


US Patent Issued to Tokyo Electron on Sept. 8 for "Substrate processing method and substrate processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,419, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing method and substrate processing apparatus" was i... Read More


US Patent Issued to Applied Materials on Sept. 8 for "Methods of selectively etching silicon nitride" (Singaporean, American Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,420, issued on Sept. 8, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Methods of selectively etching silicon nitride" was ... Read More


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Sept. 8 for "Gas phase treatment for manufacturing semiconductor structure" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,421, issued on Sept. 8, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Gas phase treatment for manufac... Read More


US Patent Issued to Tokyo Electron on Sept. 8 for "Substrate treatment method, substrate treatment apparatus, and computer storage medium" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,422, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate treatment method, substrate treatment apparatus, and comput... Read More


US Patent Issued to FUJIFILM on Sept. 8 for "Cleaning liquid and method for cleaning semiconductor substrate" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,424, issued on Sept. 8, was assigned to FUJIFILM Corp. (Tokyo). "Cleaning liquid and method for cleaning semiconductor substrate" was inven... Read More


US Patent Issued to NGK INSULATORS on Sept. 8 for "Member for semiconductor manufacturing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,425, issued on Sept. 8, was assigned to NGK INSULATORS Ltd. (Nagoya-City, Japan). "Member for semiconductor manufacturing apparatus" was in... Read More


US Patent Issued to ASM IP Holding on Sept. 8 for "Reaction chamber for processing semiconductor substrates with gas flow control capability" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,426, issued on Sept. 8, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Reaction chamber for processing semiconductor substrate... Read More


US Patent Issued to SAMSUNG ELECTRONICS, SEMES on Sept. 8 for "Apparatus of cleaning substrate, apparatus of semiconductor device and method for manufacturing a semiconductor package using the same" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,427, issued on Sept. 8, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea) and SEMES Co. LTD. (Cheonan-si, South Korea)... Read More