US Patent Issued to Tokyo Electron on Sept. 8 for "Substrate treatment method, substrate treatment apparatus, and computer storage medium" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,422, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate treatment method, substrate treatment apparatus, and computer storage medium" was invented by Kosuke Yoshihara (Koshi City, Japan), Yuichi Terashita (Koshi City, Japan), Yukinobu Otsuka (Koshi City, Japan), Shinsuke Takaki (Koshi City, Japan), Hiroki Tadatomo (Tokyo) and Naoki Shibata (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate treatment method includes developing a substrate which has a coating film of a metal-containing resist formed thereon and has been subjected to an exposure treatment and a heat treatment after the exposure treatment. The deve...