ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,427, issued on Sept. 8, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea) and SEMES Co. LTD. (Cheonan-si, South Korea).
"Apparatus of cleaning substrate, apparatus of semiconductor device and method for manufacturing a semiconductor package using the same" was invented by Hyo Shin Lim (Suwon-si, South Korea) and Ho Jun Lee (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate cleaning apparatus may include a steam injector configured to clean a substrate, a steam supplier configured to supply a steam, and a gas supplier configured to supply a gas. The steam injector may include a drive unit configu...