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US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Sept. 8 for "Gas phase treatment for manufacturing semiconductor structure" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,421, issued on Sept. 8, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Gas phase treatment for manufac... और पढ़ें


US Patent Issued to Tokyo Electron on Sept. 8 for "Substrate treatment method, substrate treatment apparatus, and computer storage medium" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,422, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate treatment method, substrate treatment apparatus, and comput... और पढ़ें


US Patent Issued to FUJIFILM on Sept. 8 for "Cleaning liquid and method for cleaning semiconductor substrate" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,424, issued on Sept. 8, was assigned to FUJIFILM Corp. (Tokyo). "Cleaning liquid and method for cleaning semiconductor substrate" was inven... और पढ़ें


US Patent Issued to NGK INSULATORS on Sept. 8 for "Member for semiconductor manufacturing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,425, issued on Sept. 8, was assigned to NGK INSULATORS Ltd. (Nagoya-City, Japan). "Member for semiconductor manufacturing apparatus" was in... और पढ़ें


US Patent Issued to ASM IP Holding on Sept. 8 for "Reaction chamber for processing semiconductor substrates with gas flow control capability" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,426, issued on Sept. 8, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Reaction chamber for processing semiconductor substrate... और पढ़ें


US Patent Issued to SAMSUNG ELECTRONICS, SEMES on Sept. 8 for "Apparatus of cleaning substrate, apparatus of semiconductor device and method for manufacturing a semiconductor package using the same" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,427, issued on Sept. 8, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea) and SEMES Co. LTD. (Cheonan-si, South Korea)... और पढ़ें


US Patent Issued to SCREEN Holdings on Sept. 8 for "Substrate treating apparatus and substrate treating method" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,428, issued on Sept. 8, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan). "Substrate treating apparatus and substrate treating metho... और पढ़ें


US Patent Issued to NGK INSULATORS on Sept. 8 for "Plug, method of manufacturing plug, and member for semiconductor manufacturing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,429, issued on Sept. 8, was assigned to NGK INSULATORS Ltd. (Nagoya-City, Japan). "Plug, method of manufacturing plug, and member for semic... और पढ़ें


US Patent Issued to Kioxia on Sept. 8 for "Semiconductor manufacturing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,430, issued on Sept. 8, was assigned to Kioxia Corp. (Tokyo). "Semiconductor manufacturing apparatus" was invented by Taishi Nakahara (Kuwa... और पढ़ें


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Sept. 8 for "Semiconductor system with an integrated wafer humidity control device" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,431, issued on Sept. 8, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD (Hsinchu, Taiwan). "Semiconductor system with an int... और पढ़ें