ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,428, issued on Sept. 8, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).
"Substrate treating apparatus and substrate treating method" was invented by Shigeru Yamamoto (Kyoto, Japan), Yasuhiko Nagai (Kyoto, Japan), Keiji Iwata (Kyoto, Japan), Takashi Akiyama (Kyoto, Japan), Akira Ito (Kyoto, Japan), Daiki Fujii (Kyoto, Japan), Kazuki Goda (Kyoto, Japan), Yosuke Nishino (Kyoto, Japan), Yuya Kawai (Kyoto, Japan) and Kenji Edamitsu (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a substrate treating apparatus for treating a substrate. The substrate treating apparatus includes a substrate treating unit configured to suppl...