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US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Oct. 27 for "Materials and methods for forming resist bottom layer" (Taiwanese Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,213, issued on Oct. 27, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan). "Materials and methods for forming r... Read More


US Patent Issued to SAMSUNG ELECTRONICS on Oct. 27 for "Method of forming photoresist patterns and baking equipment" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,214, issued on Oct. 27, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea). "Method of forming photoresist patterns and b... Read More


US Patent Issued to Carl Zeiss SMT on Oct. 27 for "Method for measuring an illumination angle distribution on an object field and illumination optics unit having an illumination channel allocation intended therefor" (German Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,215, issued on Oct. 27, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany). "Method for measuring an illumination angle distribution... Read More


US Patent Issued to SAMSUNG ELECTRONICS on Oct. 27 for "Semiconductor process apparatus" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,216, issued on Oct. 27, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Semiconductor process apparatus" was invente... Read More


US Patent Issued to SAMSUNG ELECTRONICS on Oct. 27 for "Monitoring system for manufacturing semiconductor device and monitoring method for manufacturing the semiconductor device using the same" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,217, issued on Oct. 27, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea). "Monitoring system for manufacturing semic... Read More


US Patent Issued to ASML Netherlands on Oct. 27 for "Metrology method" (Dutch Inventor)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,218, issued on Oct. 27, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands). "Metrology method" was invented by Elie Badr (Veldh... Read More


US Patent Issued to Siemens Industry Software on Oct. 27 for "Real-time patterning hotspot analyzer" (American, Indian Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,219, issued on Oct. 27, was assigned to Siemens Industry Software Inc. (Plano, Texas). "Real-time patterning hotspot analyzer" was invented... Read More


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Oct. 27 for "EUV source stabilization apparatus and method" (Taiwanese Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,220, issued on Oct. 27, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "EUV source stabilization appara... Read More


US Patent Issued to CARL ZEISS SMT on Oct. 27 for "EUV lithography system comprising a gas-binding component in the form of a foil" (German Inventor)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,221, issued on Oct. 27, was assigned to CARL ZEISS SMT GMBH (Oberkochen, Germany). "EUV lithography system comprising a gas-binding compone... Read More


US Patent Issued to CANON on Oct. 27 for "Toner and method for producing the toner" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,222, issued on Oct. 27, was assigned to CANON K.K. (Tokyo). "Toner and method for producing the toner" was invented by Masatake Tanaka (Kan... Read More