US Patent Issued to SAMSUNG ELECTRONICS on Oct. 27 for "Method of forming photoresist patterns and baking equipment" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,214, issued on Oct. 27, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).

"Method of forming photoresist patterns and baking equipment" was invented by Hyungju Ryu (Suwon-si, South Korea), Dokyeong Kwon (Suwon-si, South Korea), Sangjin Kim (Suwon-si, South Korea) and Changmin Park (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of forming a photoresist pattern are provided. A photoresist layer may be formed on a substrate. An exposure process may be performed on the photoresist layer. A post exposure baking (PEB) process may be performed on the photoresist layer with a temperature gradient in the pho...