US Patent Issued to CARL ZEISS SMT on Oct. 27 for "EUV lithography system comprising a gas-binding component in the form of a foil" (German Inventor)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,221, issued on Oct. 27, was assigned to CARL ZEISS SMT GMBH (Oberkochen, Germany).

"EUV lithography system comprising a gas-binding component in the form of a foil" was invented by Ralf Wichard (Oberkochen, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "An EUV lithography system (1) including: a housing (26), at least one reflective optical element (M1, M2) disposed within an interior (27) of the housing (26), and at least one gas-binding component (31a-c) having a gas-binding material for binding gaseous contaminating substances (29) present in the interior (27). The gas-binding component is formed as a foil (31a-c) and a coating (33, 33a,b...