ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,220, issued on Oct. 27, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"EUV source stabilization apparatus and method" was invented by Tzu Jeng Hsu (Taoyuan City, Taiwan), Shy-Jay Lin (Jhudong Township, Taiwan), Chih-Wei Wen (Tainan City, Taiwan), Hsin-Fu Tseng (Zhubei City, Taiwan), Chien-Hsing Lu (Tainan City, Taiwan) and Chih-Chiang Tu (Tauyen, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "To improve EUV emission stability, bumps and eaves are added to the interior wall of a rotating crucible that produces EUV light by vaporizing a pre-heated metal, such as tin, using a laser. The bumps and eaves preven...