ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,219, issued on Oct. 27, was assigned to Siemens Industry Software Inc. (Plano, Texas).
"Real-time patterning hotspot analyzer" was invented by Young Chang Kim (San Jose, Calif.), Marko P. Chew (Palo Alto, Calif.), Lianghong Yin (Fremont, Calif.), Abhinandan Nath (Guwahati, India) and John L. Sturtevant (Portland, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "This application discloses a hotspot identification system to generate process variability bands for structures of an integrated circuit capable of being fabricated utilizing at least one lithographic mask based, at least in part, on a mask layout data describing the lithographic mask and ...