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US Patent Issued to ASM IP Holding on Sept. 15 for "Processing chamber, assembly and a method" (Finnish Inventor)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,738,458, issued on Sept. 15, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Processing chamber, assembly and a method" was invent... Read More


US Patent Issued to Lam Research on Sept. 15 for "In situ surface coating of process chamber" (Oregon Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,738,459, issued on Sept. 15, was assigned to Lam Research Corp. (Fremont, Calif.). "In situ surface coating of process chamber" was invented b... Read More


US Patent Issued to Toto on Sept. 15 for "Semiconductor manufacturing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,738,460, issued on Sept. 15, was assigned to Toto Ltd. (Fukuoka, Japan). "Semiconductor manufacturing apparatus" was invented by Yasutaka Nitt... Read More


US Patent Issued to Kokusai Electric on Sept. 15 for "Seal structure, substrate processing apparatus, substrate processing method and method of manufacturing semiconductor device" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,738,461, issued on Sept. 15, was assigned to Kokusai Electric Corp. (Tokyo). "Seal structure, substrate processing apparatus, substrate proces... Read More


US Patent Issued to SAMSUNG ELECTRONICS on Sept. 15 for "Focus ring, substrate processing apparatus including the same, and semiconductor fabrication method using the same" (South Korean Inventor)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,738,462, issued on Sept. 15, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Focus ring, substrate processing apparatus... Read More


US Patent Issued to PSK on Sept. 15 for "Substrate treatment apparatus and substrate treatment method" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,738,463, issued on Sept. 15, was assigned to PSK INC. (Gyeonggi-Do, South Korea). "Substrate treatment apparatus and substrate treatment metho... Read More


US Patent Issued to SAMSUNG ELECTRONICS on Sept. 15 for "Substrate treatment apparatus and semiconductor device manufacturing method using the same" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,738,464, issued on Sept. 15, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Substrate treatment apparatus and semicond... Read More


US Patent Issued to SEKISUI CHEMICAL on Sept. 15 for "Surface modification method" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,738,465, issued on Sept. 15, was assigned to SEKISUI CHEMICAL Co. Ltd. (Osaka, Japan). "Surface modification method" was invented by Eiji Miya... Read More


US Patent Issued to Applied Materials on Sept. 15 for "Real-time detection of particulate matter during deposition chamber manufacturing" (California Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,738,467, issued on Sept. 15, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Real-time detection of particulate matter during d... Read More


US Patent Issued to Taiwan Semiconductor Manufacturing on Sept. 15 for "Permeance magnetic assembly" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,738,468, issued on Sept. 15, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Permeance magnetic assembly" was ... Read More