US Patent Issued to Korea Adanced Institute of Science and Technology on June 23 for "3-dimensional memristor element and method for manufacturing the same" (South Korean Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,882, issued on June 23, was assigned to Korea Adanced Institute of Science and Technology (Daejeon, South Korea). "3-dimensional memristor ... Read More

US Patent Issued to Taiwan Semiconductor Manufacturing on June 23 for "Direct non-ohmic switch for voltage instability protection and methods for forming the same" (Taiwanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,883, issued on June 23, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Direct non-ohmic switch for voltage... Read More

US Patent Issued to ROHM on June 23 for "SiC semiconductor substrate and fabrication method of the SiC semiconductor substrate" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,884, issued on June 23, was assigned to ROHM Co. LTD. (Kyoto, Japan). "SiC semiconductor substrate and fabrication method of the SiC semico... Read More

US Patent Issued to ASM IP Holding on June 23 for "Systems and methods for deposition of molybdenum for source/drain contacts" (Arizona Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,885, issued on June 23, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Systems and methods for deposition of molybdenum for so... Read More

US Patent Issued to Applied Materials on June 23 for "Flowable CVD film defect reduction" (California Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,886, issued on June 23, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Flowable CVD film defect reduction" was invented by ... Read More

US Patent Issued to ASM IP Holding on June 23 for "Methods for depositing gap-filling fluids and related systems and devices" (Belgian Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,887, issued on June 23, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Methods for depositing gap-filling fluids and related s... Read More

US Patent Issued to SPTS Technologies on June 23 for "Deposition of thick layers of silicon dioxide" (British Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,888, issued on June 23, was assigned to SPTS Technologies Ltd. (Newport, Great Britain). "Deposition of thick layers of silicon dioxide" wa... Read More

US Patent Issued to CAMBRIDGE ENTERPRISE on June 23 for "Method for porosifying a material and semiconductor structure" (British Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,889, issued on June 23, was assigned to CAMBRIDGE ENTERPRISE LTD (Cambridge, Great Britain). "Method for porosifying a material and semicon... Read More

US Patent Issued to ASM IP Holding on June 23 for "Method of depositing condensable material onto a surface of a substrate" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,890, issued on June 23, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Method of depositing condensable material onto a surfac... Read More

US Patent Issued to Applied Materials on June 23 for "Area selective carbon-based film deposition" (Singaporean, American Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,891, issued on June 23, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Area selective carbon-based film deposition" was inv... Read More

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