US Patent Issued to Applied Materials on June 23 for "Area selective carbon-based film deposition" (Singaporean, American Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,891, issued on June 23, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Area selective carbon-based film deposition" was invented by Xinke Wang (Singapore), Bhaskar Jyoti Bhuyan (San Jose, Calif.), Zeqing Shen (San Jose, Calif.), Susmit Singha Roy (Campbell, Calif.), Abhijit Basu Mallick (Sunnyvale, Calif.), Jiecong Tang (Singapore), John Sudijono (Singapore) and Mark Saly (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of selectively depositing a carbon-containing layer are described. Exemplary processing methods may include flowing a first precursor over a substrate comprising a metal surface and a non-me...