ALEXANDRIA, Va., July 14 -- United States Patent no. 12,683,122, issued on July 14, was assigned to Tokyo Electron Ltd. (Tokyo). "Etching method and plasma processing apparatus" was invented by Taihe... और पढ़ें
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,683,123, issued on July 14, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Pulsed voltage waveform biasing of plasma" was inven... और पढ़ें
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,683,124, issued on July 14, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Substrate processing apparatus using plasma phase shift... और पढ़ें
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,683,125, issued on July 14, was assigned to ASM IP HOLDING B.V. (Netherlands). "Variable capacitor array for RF impedance matching network" was... और पढ़ें
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,683,126, issued on July 14, was assigned to SPTS Technologies Ltd. (Newport, Great Britain). "Method of plasma etching" was invented by Alex Hu... और पढ़ें
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,683,127, issued on July 14, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Chemical vapor deposition appar... और पढ़ें
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,683,128, issued on July 14, was assigned to KIOXIA Corp. (Tokyo). "Plasma chemical vapor deposition (CVD) apparatus and film forming method" wa... और पढ़ें
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,683,129, issued on July 14, was assigned to EUGENE TECHNOLOGY Co. LTD. (South Korea). "Batch type substrate processing apparatus" was invented ... और पढ़ें
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,683,130, issued on July 14, was assigned to NEW POWER PLASMA Co. LTD. (Suwon-si, South Korea). "Plasma reaction apparatus" was invented by Dai ... और पढ़ें
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,683,131, issued on July 14, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Apparatus and methods for controlling substrate temp... और पढ़ें