ALEXANDRIA, Va., July 14 -- United States Patent no. 12,683,124, issued on July 14, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Substrate processing apparatus using plasma phase shift" was invented by Songwhe Herr (Seongnam-si, South Korea), Jeongsu Lee (Pyeongtaek-si, South Korea), Dongok Shin (Suwon, South Korea) and DaeYoun Kim (Seo-gu, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing system using plasma would be presented. The system may comprise a plurality of reaction chambers disposed on a platform, each of them being configured to process substrates; a plasma generator or generator coupled to the plurality of reaction chambers individually and configur...