US Patent Issued to Applied Materials on July 14 for "Pulsed voltage waveform biasing of plasma" (California Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,683,123, issued on July 14, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Pulsed voltage waveform biasing of plasma" was invented by Shreeram Jyoti Dash (San Jose, Calif.) and Michael T. Nichols (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the disclosure include apparatus (e.g., plasma processing systems) and methods for the plasma processing of a substrate in a processing chamber. Some embodiments are directed to a method for waveform generation, which generally includes delivering a radio frequency (RF) waveform at a frequency for a first period of time using a RF generator and then halting the deli...