ALEXANDRIA, Va., July 21 -- United States Patent no. 12,688,993, issued on July 21, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel). "Multiple electron beam optics" was invented by Al... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,688,994, issued on July 21, was assigned to Hitachi High-Tech Corp. (Tokyo). "Stage device, and charged particle beam device" was invented by M... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,688,995, issued on July 21, was assigned to Institute of Biophysics, Chinese Academy of Sciences (Beijing). "Method of processing ion beam base... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,688,996, issued on July 21, was assigned to FEI COMPANY (Hillsboro, Ore.). "System for sensor protection in electron imaging applications" was ... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,688,997, issued on July 21, was assigned to DOCTOR X WORKS BV (NL/NL) (Eindhoven, Netherlands). "Microwave synchronisation system" was invented... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,688,998, issued on July 21, was assigned to D2S Inc. (San Jose, Calif.). "Method and system for determining a charged particle beam exposure fo... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,688,999, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Symmetric antenna arrays for high density plasma enh... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,000, issued on July 21, was assigned to Semes Co. Ltd. (Cheonan-si, South Korea). "Substrate processing apparatus" was invented by Sangjeon... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,001, issued on July 21, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma potential adjustment circuit" was invented by Qiang Wang (Aust... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,002, issued on July 21, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma processing apparatus, power source system, and plasma processi... Read More