US Patent Issued to Hitachi High-Tech on July 21 for "Stage device, and charged particle beam device" (Japanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,688,994, issued on July 21, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Stage device, and charged particle beam device" was invented by Motohiro Takahashi (Tokyo), Masaki Mizuochi (Tokyo), Shuichi Nakagawa (Tokyo), Tomotaka Shibazaki (Tokyo), Hironori Ogawa (Tokyo) and Takanori Kato (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides: a stage device that can suppress bending deformation of a mirror, and that can reduce the positioning error of a stage by reducing the measurement error of the position of the stage; and a charged particle beam device comprising this stage device. The stage device according to the pre...