US Patent Issued to FEI on July 21 for "System for sensor protection in electron imaging applications" (Dutch Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,688,996, issued on July 21, was assigned to FEI COMPANY (Hillsboro, Ore.).

"System for sensor protection in electron imaging applications" was invented by Peter Christiaan Tiemeijer (Eindhoven, Netherlands), Erwin de Jong (Best, Netherlands), Andrei Radulescu (Veldhoven, Netherlands), James McCormack (Eindhoven, Netherlands) and Jeroen Keizer (Winterlre, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention relates to a system for sensor protection in electron imaging applications comprising a beam control device configured to provide a beam signal based on an incoming beam signal, wherein the beam signal comprises an altered beam int...