ALEXANDRIA, Va., July 21 -- United States Patent no. 12,688,993, issued on July 21, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel).
"Multiple electron beam optics" was invented by Alon Litman (Nes-Ziona, Israel) and Ron Naftali (Shoham, Israel).
According to the abstract* released by the U.S. Patent & Trademark Office: "Multiple electron beam optics that includes a detection unit that comprises an array of sensors, and a cross talk reduction unit. For each sensor of multiple sensors of the array of sensors: (i) the sensor includes an aperture and a sensing region that is configured to sense relevant backscattered electrons, the relevant backscattered electrons are emitted from the sample as a result of an illumination of ...